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Semiconductor metrology and inspection
Meeting market demand for semiconductor wafers with high-radiance UV light sources
High production yields are critical to meeting today’s market demand for semiconductor wafers. Metrology and inspection are crucial steps in the long semiconductor manufacturing process to ensure the highest quality and yield.
Wafer metrology tools play a crucial role in the design and fabrication of high-performance integrated circuits (ICs) by aiding semiconductor manufacturers in minimizing defects and meeting increasing demands. Efficient characterization and measurement of thin films, line widths, pattern flaws, and other potential defects are essential for addressing issues swiftly, thereby reducing costly downtime. In semiconductor inspection, using higher radiance UV light sources becomes imperative to shorten inspection times and enhance accuracy in evaluating patterns and thin films on wafers.
To respond to this demand, Energetiq Technology, a wholly owned subsidiary of Hamamatsu Photonics has combined its deep understanding of the plasma physics needed for high-brightness light generation with its long experience in building rugged products such as the Laser-Driven Light Source (LDLS®) and the Laser-Driven Tunable Light Source (LDTLS®).
High spectral radiance light sources
The broad wavelength, high spectral radiance light sources illuminate wafer anomalies with speed and accuracy. The unique principle of operation of the LDLS® with its small plasma size and high spatial stability enables high throughput measurements ideal for volume production environments.
Its sister product, built on the same technology with the added tunable feature, the LDTLS® helps users break free from wavelength constraints for quick, repeatable, and precise measurements across a broader spectrum.
These solutions are optimal to meet the inspection needs because they provide excellent luminance over a broad spectral range along with a long service life.
LDLS®
The LDLS® is one of the only light sources in the world that utilizes a focused laser beam to generate and maintain plasma between the discharge electrodes in the xenon gas-filled bulb. Learn more about this product by following this link: Laser-Driven Light Sources (LDLS®)
LDTLS®
Built around the LDLS® technology, the LDTLS® gives you access to a wide wavelength range of tunability, high spectral resolution, and an extremely long lifetime with the convenience of fiber-coupled output. The LDTLS® features a precision high-performance monochromator for accurate wavelength selection and repeatable light output.
Features:
- High spectral radiance for the highest output flux
- High output power
- Low noise, high stability
- 200 nm/second scan speed
- 10,000+ hours of operation
LDTLS® Typical in-band flux
LDTLS® product-range
| TLS-EQ-9 | TLS-EQ-77 | TLS-EQ-77-UV | TLS-EQ-77-NIR | |
|---|---|---|---|---|
| Wavelength Range | 380 nm - 1100 nm | 350 nm - 1100 nm | 200 nm - 770 nm | 800 nm - 1700 nm |
| Wavelength Accuracy | +/- 0.5 nm | +/- 0.5 nm | +/- 0.5 nm | +/- 0.5 nm |
| Scan Speed | <20 ms for a 2 ms step | <20 ms for a 2 ms step | <20 ms for a 2 ms step | <20 ms for a 2 ms step |
| Standard Optical Output | 1500 μm score diameter fibre optic cable | 1500 μm score diameter fibre optic cable | 1500 μm score diameter fibre optic cable | 1500 μm score diameter fibre optic cable |
| Numerical Aperture (NA) | 0.39 | 0.39 | 0.39 | 0.39 |
| Spectral Resolution (FWHM) | User selectable: 1.0 - 8.0 nm | 6.5 nm | 4.7 nm | 9 nm |
| Laser Class | Class 1 (IEC 60825: 2014) | Class 1 (IEC 60825: 2014) | Class 1 (IEC 60825: 2014) | Class 1 (IEC 60825: 2014) |
| Maximum In-Band Flux | 2.37 mW at 824 nm | 4.9 mW at 400 nm | 1.6 mW at 300 nm | 1.62 mW at 920 nm |
| Average In-Band Flux | ~1.20 mW | ~2.3 mW | ~1.1 mW (200 nm - 500 nm) | ~0.44 mW |
Resources
Read the extensive resources for additional information including application notes, articles, papers & posters, and more.
Recommended products
Besides the LDLS® and LDTLS®, Hamamatsu Photonics offers a full line-up of high-performance light sources including extreme ultraviolet (EUV) light sources and xenon lamps to respond to constantly changing needs in the semiconductor inspection equipment market.
Contact
If you are interested in this product, please contact us for the selection guide. The LDLS® and LDTLS® are products developed by Energetiq Technology inc. in the US, which is a subsidiary of Hamamatsu Photonics K.K.
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