Monitoring systems for the plasma emissions in real time, and the camera systems to measurement of plasma utilizing the high speed gate operation.

Plasma process monitor

Plasma-process monitor

Plasma process monitors to monitor plasma emissions during its semiconductor manufacturing processes such as etching, sputtering and CVD.

Multiband plasma-process monitor: C10346-01

    • 200 nm to 950 nm

    Plasma process monitor to monitor multipoints of plasma emissions (200 nm to 950 nm) in real time.

    Multiband plasma-process monitor: C10346-02

      • 300 nm to 800 nm

      Plasma process monitor to monitor multipoints of plasma emissions (300 nm to 800 nm) in real time.

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