Stealth dicing technology Stealth dicing technology

Journal / Conference information | Stealth Dicing™ technology

Stealth Dicing technology is a laser dicing technology that uses lasers, with a completely new concept. The range of devices to which this technology applies will be expanding to include MEMS devices and memory devices and others, due to such features as the "completely dry process", "no kerf loss", "no chipping", "high bending strength" and the like.

Journal information

International journals

  • H. Kiyota, K. Hara, M. Jankowski, and M. M. Fejer, “Numerical simulation and validation of subsurface modification and crack formation induced by nanosecond-pulsed laser processing in monocrystalline silicon,” J. Appl. Phys., vol. 127, no. 8, 85106, Feb. 2020, doi: 10.1063/1.5130701.
  • Y. Takiguchi, M. Oyaizu, M. Nakano, T. Inoue, and H. Toyoda, “Suppression of backside damage in nanosecond internal-focusing pulse laser dicing with wavefront modulation,” Opt. Eng., vol. 56, no. 7, pp. 1–7, Jul. 2017, doi: 10.1117/1.OE.56.7.077109.
  • M. Kumagai, N. Uchiyama, E. Ohmura, R. Sugiura, K. Atsumi, and K. Fukumitsu, “Advanced Dicing Technology for Semiconductor Wafer—Stealth Dicing,” IEEE Trans. Semicond. Manuf., vol. 20, no. 3, pp. 259–265, 2007, doi: 10.1109/TSM.2007.901849.

Journals (Japan)

  • E. Ohmura, M. Kumagai, K. Fukumitsu, M. Nakano, N. Uchiyama, and H. Morita, “Internal Modification of Ultra Thin Silicon Wafer by Permeable Pulse Laser,” J. Japan Soc. Precis. Eng., vol. 74, no. 3, pp. 275–281, 2008, doi: 10.2493/jjspe.74.275.
  • E. Ohmura, K. Fukumitsu, M. Kumagai, and H. Morita, “Analysis of Internal Modified-Layer Formation Mechanism into Silicon Single Crystal with Nanosecond Laser,” Trans. Japan Soc. Mech. Eng. Ser. C, vol. 74, no. 738, pp. 446–452, 2008, doi: 10.1299/kikaic.74.446.

Conference information

International conferences

  • N. Suzuki, T. Nakamura, Y. Kondo, S. Tominaga, K. Atsumi, and T. Ohba, “Damage-Less Singulation of Ultra-Thin Wafers using Stealth Dicing,” 2020 IEEE 70th Electronic Components and Technology Conference (ECTC), 2020, pp. 1043–1049, doi: 10.1109/ECTC32862.2020.00169.
  • N. Suzuki, K. Atsumi, N. Uchiyama, and T. Ohba, “Improving Throughput of Zero-Kerf Singulation for Ultra-Thin Wafers using Stealth Dicing,” 2018 13th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2018, pp. 55–57, doi: 10.1109/IMPACT.2018.8625832.
  • Y. Nara and H. Kiyota, “Direct observation of internal void formations in Stealth Dicing,” Proc.SPIE, Feb. 2018, vol. 10520, doi: 10.1117/12.2288238.
  • Y. Nara and H. Kiyota, “Stealth Dicing technology with SWIR laser realizing high throughput Si wafer dicing,” Proc.SPIE, Feb. 2018, vol. 10520, doi: 10.1117/12.2289235.
  • N. Suzuki, X. Shiqin, K. Atsumi, N. Uchiyama, and T. Ohba, “Laser dicing for higher chip productivity,” 2016 11th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2016, pp. 62–64, doi: 10.1109/IMPACT.2016.7799992.
  • Y. Takiguchi, N. Matsumoto, M. Oyaizu, J. Okuma, M. Nakano, T. Sakamoto, H. Itoh, and T. Inoue, “Improvement of laser dicing system performance I: high-speed, high-quality processing of thick silicon wafers using spatial light modulator,” Proc.SPIE, Mar. 2013, vol. 8608, doi: 10.1117/12.2003639.
  • Y. Takiguchi, N. Matsumoto, M. Oyaizu, J. Okuma, M. Nakano, T. Sakamoto, H. Itoh, and T. Inoue, “Improvement of laser dicing performance II: dicing rate enhancement by multi beams and simultaneous aberration correction with phase-only spatial light modulator,” Proc.SPIE, Mar. 2013, vol. 8608, doi: 10.1117/12.2003649.
  • E. Ohmura, Y. Kawahito, K. Fukumitsu, J. Okuma, and H. Morita, “Analysis of internal crack propagation in silicon due to permeable pulse laser irradiation: study on processing mechanism of stealth dicing,” Proc.SPIE, Feb. 2011, vol. 7996, doi: 10.1117/12.887431.

Conferences (Japan)

  • D. Kawaguchi, Y. Sekimoto, K. Hara, and W. Matsudaira, “Fabrication of crack-free device using Stealth Dicing,” Proc. Mech. Eng. Congr. Japan, vol. 2018, p. J2230101, 2018, doi: 10.1299/jsmemecj.2018.J2230101.
  • D. Kawaguchi, Y. Sekimoto, H. Kiyota, K. Hara, and Y. Igasaki, “Mechanical reliability improvement by the internal resorption type laser dicing,” Proc. Mech. Eng. Congr. Japan, vol. 2017, p. J2210202, 2017, doi: 10.1299/jsmemecj.2017.J2210202.

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