Hamamatsu develops 300 kV open-type microfocus X-ray source for nondestructive inspection

2013/10/03

Hamamatsu, Japan – October 3, 2013 – Hamamatsu Photonics K.K. has developed an open-type 300 kV microfocus X-ray source that provides a minimal focal spot size of only 4 microns. This extremely small focal spot size can enable the acquisition of highly detailed images for applications in nondestructive inspection, such as looking for defects in various types of components. The new microfocus X-ray source is scheduled to be released in summer 2014.

 

Prior to its release, Hamamatsu will exhibit the new open-type 300 kV microfocus X-ray source at Photon Fair 2013, the company’s new technology exhibition to be held from November 7 to 9 at the Act City Hamamatsu convention center in Hamamatsu, Japan.

 

300 kV microfocus X-ray source  

300 kV microfocus X-ray source

 

 

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