Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.

2 items found

c10346-01 product photo

Multiband plasma-process monitor: C10346-01

  • 200 nm to 950 nm

Plasma process monitor to monitor multipoints of plasma emissions (200 nm to 950 nm) in real time.

c10346-02 product photo

Multiband plasma-process monitor: C10346-02

  • 300 nm to 800 nm

Plasma process monitor to monitor multipoints of plasma emissions (300 nm to 800 nm) in real time.

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