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PHEMOS-1000 Emission microscope
C11222-16
The PHEMOS-1000 is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by semiconductor device defects. Since the PHEMOS-1000 is usable in combination with a general-purpose prober, you can do various analysis tasks by using the sample setups you are already familiar with. Installing an optional laser scan system allows acquiring high-resolution pattern images. Different types of detectors are available for various analysis techniques such as emission analysis, thermal analysis, and IR-OBIRCH analysis. The PHEMOS-1000 supports a wide variety of tasks and applications ranging from prober socket boards to a large-size 300 mm wafer prober.
Features
- Two ultra-high sensitivity cameras mountable
- Lasers for up to 3 wavelengths and a probe light source for EOP are mountable
- Equipped with optical stage suitable for diverse samples
Options
- Includes laser scan system
- Emission analysis with high-sensitivity near-infrared camera
- Thermal analysis with high-sensitivity mid-infrared camera
- IR-OBIRCH analysis
- Dynamic analysis by laser irradiation
- EO probing analysis
- High-resolution and high-sensitivity analysis using NanoLens
- Connects to CAD Navigation
- Connects to LSI tester
Display functions
Superimposed display/contrast enhancement function
The PHEMOS-1000 superimposes the emission image on a high-resolution pattern image to localize defect points quickly. The contrast enhancement function makes an image clearer and more detailed.
Display function
- Annotations: Comments, arrows, and other indicators can be displayed on an image at any location desired.
- Scale display: The scale width can be displayed on the image using segments.
- Grid display: Vertical and horizontal grid lines can be displayed on the image.
- Thumbnail display: Images can be stored and recalled as thumbnails, and image information such as stage coordinates can be displayed.
- Split screen display: Pattern images, emission images, superimposed images, and reference images can be displayed in a 4-window screen at once.
Specifications
| Dimensions/Weights | Main unit: 1340 mm (W)×1200 mm (D)×2110 mm (H), Approx. 1500 kg Control rack: 880 mm (W)×820 mm (D)×1542 mm (H), Approx. 150 kg Operation desk: 1000 mm (W)×800 mm (D)×700 mm (H), Approx. 45 kg |
|---|---|
| Line voltage | AC200 V (50 Hz/60 Hz) |
| Power consumption | Approx. 1400 VA (Max. 3300 VA) |
| Vacuum | Approx. 80 kPa or more |
| Compressed air | 0.5 MPa to 0.7 MPa |
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