The Optical MicroGauge Thickness measurement system C11011 series is a film thickness measurement system utilizing laser interferometry. Allows for high speed measurement at 60 Hz, so it can also be
used inline measurement in factories. Combine with the optional mapping system to allow for prototype thickness distribution measurement. It can be used in a wide variety of applications, from monitoring manufacturing processes to quality control.
The C11011-01W measures glass from 25 μm to 2900 μm and from 10 μm to 1200 μm.
|Measurable film thickness range (glass)||25 μm to 2900 μm*1|
|Measurable film thickness range (silicon)||10 μm to 1200 μm*2|
|Measurement reproducibility (silicon)||100 nm*3|
|Measurement accuracy (silicon)||< 500 μm: ±0.5 μm, > 500 μm: ±0.1 %*3|
|Light source||Infrared LD (1300 nm)|
|Spot size||Approx. φ60 μm*4|
|Working distance||155 mm*4|
|Number of measurable layers||1-layer|
|Measurement time||22.2 ms/point*5|
|External control function||RS-232C, PIPE|
|Interface||USB 2.0 (Main unit - Computer)|
|Power supply||AC100 V to AC240 V, 50 Hz/60 Hz|
|Power consumption||Approx. 50 VA|
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