The Multipoint NanoGauge Thickness measurement system C11295 is a film thickness measurement system utilizing spectral interferometry. It is designed to measure film thickness as part of the semiconductor manufacturing process, as well as for quality control of the APC and films that are mounted on semiconductor manufacturing equipment. Allows multichannel measurement in real time, which provides simultaneous multichannel measurement and multipoint measurement on film surfaces. At the same time it can also measure reflectivity (transmittance), object color, and their changes over time.
|Measurable film thickness range (glass)||20 nm to 100 μm*2|
|Measurement reproducibility (glass)||0.02 nm*3 *4|
|Measurement accuracy (glass)||±0.4 %*4 *5|
|Light source||Xenon light source *6|
|Measurement wavelength||320 nm to 1000 nm|
|Spot size||Approx. φ1 mm*4|
|Working distance||10 mm*4|
|Number of measurable layers||Max. 10 layers|
|Analysis||FFT analysis, Fitting analysis|
|Measurement time||19 ms/point*7|
|Fiber connector shape||SMA|
|Number of measurement points||2 to 15|
|External control function||Ethernet|
|Interface||USB 2.0 (Main unit - Computer)
RS-232C (Light source - Computer)
|Power supply||AC100 V to AC240 V, 50 Hz/60 Hz|
|Power consumption||At 2ch: Approx. 350 VA, at 15ch: Approx. 500 VA|
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