FLAT EXCIMER FLAT EXCIMER

Application: Dry cleaning | FLAT EXCIMER

This excimer lamp light source employs a flat lamp and RF (radio frequency) discharge to achieve uniform irradiation and stable output with minimal flickering.

Compared to conventional corona discharge and plasma methods, it causes no damage and generates no dust.

Irradiation with vacuum UV light breaks the chemical bonds of organic materials and oxidizes and volatilizes them to remove organic contaminants on the surface. The 172 nm wavelength vacuum UV light emitted from an excimer lamp light source has a high absorption coefficient for oxygen, generating a high concentration of active oxygen and ozone, as well as excellent ability to break molecular bonds of organic materials. This method has advantages such as improving yield due to its high cleaning quality and is especially effective for materials that cannot be wet-cleaned or materials that are sensitive to heat.

Application examples

  • Cleaning of wafers and glass substrates
  • Removal of resist residues, adhesive residues, organic films, and oil stains

Cleaning of Au-deposited mirrors for lasers

Before cleaning

After cleaning

Removal of space liquid residue from wafers

Before cleaning

After cleaning

Removal of acetone cleaning residue

Before cleaning

After cleaning

Principle (typical example)

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