PHEMOS-X Emission microscope
The PHEMOS-X is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by defects.
Coverage of different detection wavelength ranges for emission analysis and thermal analysis, or visible light and near-infrared light, allows easily selecting an analysis technique that matches the sample and failure mode.
Working range of optical stage
* Working range might be narrower than these values due to the prober being used and interference with the sample stage or mounting of a NanoLens.
Applicable for emission and laser analysis.
The PHEMOS-X superimposes the emission image on a high-resolution pattern image to localize defect points quickly.
The contrast enhancement function makes an image clearer and more detailed.
As devices become more complicated, there is increased demand for analysis under an LSI tester connection to find a failure occurring at a specific point while a device is functioning. It is possible to connect an LSI tester with the PHEMOS-X by a short cable and using a probe card adapter specifically designed for the analysis under the PHEMOS-X optics.
|Dimensions/Weights||Main unit: 1656 mm (W)×2000 mm (H)×1247 mm (D), Approx. 1640 kg
Operation desk*1: 1000 mm (W) × 700 mm (H) × 800 mm (D) Approx. 39.2 kg / 1480 mm (W) × 700 mm (H) × 800 mm (D) Approx. 48.6 kg
|Line voltage||Single phase 200 V to 240 V|
|Power consumption||Approx. 3300 VA|
|Vacuum||80 kPa or more|
|Compressed air*1||0.6 MPa to 0.7 MPa|
*2: Include a regular
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