Multiband plasma-process monitor


The Multiband plasma-process monitor C10346-01 is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multichannel recording in real-time.


Type numberC10346-01
Wavelength range200 nm to 950 nm
Wavelength accuracy±0.75 nm
Wavelength resolution (FWHM)<2 nm
Power supplyAC100 V to AC240 V (50 Hz/60 Hz)
Power consumptionApprox. 70 VA
Digital output terminal (Determinate signal output)TTL maximum 5 channels (3 channels maximum when measurement trigger signal is used
Digital input terminal (starting measurement trigger signal) TTL 1 channel Using TTL 5 channel
Digital output terminal (Busy signal)TTL 1 channel Using TTL 4 channel
Analog output terminal2 channels 0 V to 10 V
Fiber probe connectorSMA
Communicate interfaceUSB 2.0 Type B
Ambient operating temperature+10 ˚C to +30 ˚C


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