Optical NanoGauge C12562-04 | Hamamatsu Photonics

The Optical NanoGauge Thickness measurement system C12562 is a compact, space-saving, non-contact film thickness measurement system designed to easily install in equipment where needed. In the semiconductor industry, measuring silicon thickness is essential due to the spread of through-silicon via technology; and in the film production industry, adhesion layer films are being made ever thinner to meet product specifications. So these industries now require even higher accuracy in thickness measurements ranging from 1 μm to 300 μm. The C12562 allows making accurate measurements across a wide thickness range from 500 nm to 300 μm that include the thin film coating and film substrate thickness as well as the total thickness. The C12562 also offers rapid measurements up to 100 Hz making it ideal for measurements on high-speed production lines.

Catalog 822 KB/PDF

Features
Measurement principle: spectral interferometry
Specifications
Dimensions

Features

Measures ranging from thin film thickness to the total thickness
Shortens cycle time (max. 100 Hz)
Enhanced external triggers (accommodates high-speed measurement)
Simplified measurement is added to the software
Capable of both surface analysis
Precise measurement of fluctuating film
Analyze optical constants (n, k)
External control available

Measurement principle: spectral interferometry

Multiple reflections occur inside the thin film as light enters a thin film sample. These multiple-reflection light waves boost or weaken each other along with their phase difference. The phase difference of each multiple-reflection light is determined by the light wavelength and optical path length. Therefore, the reflected or transmitted spectrum from the sample shows a specific spectrum determined by the film thickness.

Spectral interferometry is a technique for measuring film thickness by analyzing that particular spectrum. The Optical NanoGauge Thickness measurement system utilizes spectral interferometry to analyze a target spectrum by the curve-fitting or FFT (Fast Fourier Transform) method that matches your application.

Measurement principle: spectral interferometry

The number of signals is increased as the film thickens. The signal intervals in short wavelength range appears more often than those in the long wavelength range.

Specifications

Type number	C12562-04
Measurable film thickness range (glass)	500 nm to 300 μm^*1
Measurement reproducibility (glass)	0.2 nm^{2 3}
Measurement accuracy (glass)	±0.4 %^{3 4}
Light source	Halogen light source
Spot size	Approx. φ1 mm^*3
Working distance	10 mm^*3
Number of measurable layers	Max. 10 layers
Analysis	FFT analysis, Fitting analysis, Optical constant analysis
Measurement time	3 ms/point^*5
Fiber connector shape	FC
External control function	RS-232C, Ethernet
Power supply	AC100 V to AC240 V, 50 Hz/60 Hz
Power consumption	Approx. 80 VA

*1 When converted with the refractive index of glass = 1.5.
*2 Standard deviation (tolerance) when measuring 1 μm thick glass film.
*3 Depending on optical system or objective lens magnification to be used.
*4 Range of measurement guarantee as recorded in the VLSI Standards measurement guarantee document.
*5 Shortest exposure time.