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Application and measurement examples | Thickness measurement system
Application example of thickness measurement system
Semiconductor
Film thickness measurement on wafer surface
Accurately measure the thickness of photoresist and other films applied or processed in various steps to ensure uniform deposition.
Our systems support a wide range of film thicknesses and wafer thicknesses. By adopting high-brightness, short-wavelength light sources, they also enable precise measurement of ultra-thin films.
- Metal-oxide coating such as SiO2, SiC film, Si film, TiO2 etc.
- Nitrided film, Wet state film, Resist film
- Silicon residual film thickness, Optical disk, DLC, Carbon
In-situ measurement during deposition
Monitor film thickness in real time during deposition to verify that thickness variation is controlled.
Our systems achieve space-saving measurement with the installation of a single light guide. By employing an optical system, they support long working distances and enable versatile film thickness measurement across various processes.
- Metal-oxide coating such as SiO2 and Si
Wafer thickness measurement
Measure wafer thickness to ensure uniformity and quality control during processing steps.
Our systems cover a wide range—from 775 μm Si wafers to 10 μm thin films—with a single unit. In addition, high-speed measurement at 60 Hz enables real-time monitoring during processing.
- SiO2, Si film, Wet state film
- Silicon residual film thickness
Others
Coating Films, plastic films, and object color measurement
- AR coating, PET, Coating layer
- PE, PMMA
- Coating film, Evaporation film, Functionality film
- Ag Nanowire, Acrylic resin, Video head
Film thickness and color measurement of flat panel
- Cell gap, Organic EL film, Alignment film, TFT
- Ag Nanowire, ITO, MgO, Resist film on glass substrate, Polyimide
- High-functioning film, Color film for FPD
Measurement example of thickness measurement system
Interference spectrum measurement example of transparent electrode (ITO film: 350 nm)
The analyzed film thickness is the theoretical value, which is the least RMS (Root Mean Square) value of the theoretical wave pattern and measurement reflection pattern.
Measurement example of etalon (30 μm)
Fig. 1: Measurement of etalon
Fig. 2: Fourier transform of Fig. 1
Measurement example of standard oxide film (400 nm)
Patterned wafer / Bonded wafer / In-situ monitoring example (Thickness measurement data)
Film thickness mapping on wafer
Measure the entire wafer thickness distribution with exceptional accuracy using Hamamatsu Photonics’ HyperGauge and Optical Gauge series, equipped with an optional mapping stage. We provide the optimal lineup tailored to your application and thickness requirements. Contact us for more information.
- Confirmation
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