In general, scratches, dust, and wiring failures can be detected by appearance inspections such as automated optical inspection, but cracks in crystals and defects in LED chips cannot be adequately detected by AOI.
Hamamatsu Photonics has focused on the "emission wavelength" and "emission intensity" that can be measured by PL-based imaging and developed a technology to detect defects and impurities inside the crystal of semiconductor wafers for micro LEDs.
As MiNY PL allows defects detection with highly sensitive images, clear observation of microscopic defects will be possible.
Combining this internal inspection using PL measurement with appearance inspection makes more precise inspections possible.
Subtle variations in the emission wavelength of the micro LEDs are said to directly affect the color and brightness of the display. Variations in emission wavelength is a key parameter for producing micro LEDs with uniform hue and brightness.
MiNY PL can visualize variations in emission wavelengths within a wafer as color irregularities by converting differences in emission wavelengths from chip to chip into a mapping image. This enables more precise and efficient determination of wafer quality.
The emission spectrum can also be measured by using the optional spectroscopic analysis module.
The software for MiNY PL acquires and displays appearance and PL images. It also has the performances to enhance the accuracy of analysis such as analysis supporting various.
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