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In-line wet process concentration monitoring
In-line wet process concentration monitoring for precision control in semiconductor manufacturing
In-line wet process concentration monitoring involves real-time control of chemical concentrations during semiconductor manufacturing steps like photoresist coating, etching, and oxidation diffusion. NIR spectroscopy ensures quality and consistency in these processes.
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This Fourier transform type near-infrared spectrometer can be carried with one hand. The spectrometer has a built-in Michelson optical interferometer and control circuit, and can measure spectra and absorbance by connecting to a PC via USB.
This compact spectrometer compactly integrates an optical system, image sensor, and circuitry. The spectrometer has peak sensitivity in the near infrared.
High signal-to-noise ratio (SNR) InGaAs image sensor enhances fiber-coupled NIR spectrometers, enabling remote placement and multi-constituent analysis. This technology prevents costly yield losses by ensuring optimal chemical compositions, improving process control, and maintaining product quality.
Semiconductor processes using in-line wet process concentration monitoring
Precise chemical control in the photoresist coating process ensures uniform wafer layers. In-line wet process concentration monitoring maintains the solution's composition, controlling coating thickness and ensuring consistent adherence. This precision is crucial for accurate patterning in lithography.
In etching processes, maintaining proper concentration is crucial for precise material removal. In-line monitoring ensures accurate and controlled etching, promoting uniformity and preventing defects across the wafer.
In oxidation diffusion film deposition, in-line monitoring controls oxidizing agents and dopants' concentrations, ensuring desired film properties like thickness and electrical characteristics. This real-time control ensures film quality and prevents performance-impacting variations in semiconductor devices.
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