バイアス抵抗は、Poly-Si抵抗で作成され、数100 kΩ～数10 MΩの範囲で適当な値に調整することが可能です (特注品)。
カップリング容量は、ストライプ拡散層 (strip diffusion layer)と読み出しAL電極の間にある絶縁膜 (カップリング膜)によって決まります。120 pF/mm2～180 pF/mm2程度の範囲で適当な値に調整することが可能ですが (特注品)、カップリング膜が高耐圧であるほど大きなカップリング容量とすることが困難になります。たとえばカップリング膜の耐圧が100 Vの場合では、カップリング容量は140 pF/mm2程度以下になります。
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