ステルスダイシング™技術は、レーザを用いた全く新しい概念のレーザダイシング技術です。「完全ドライプロセス」「切削ロスゼロ」「チッピングレス」「高い抗折強度」などの特長により、MEMSデバイスやメモリデバイスなど、適応デバイスは拡大しています。
ステルスダイシング技術は、対象材料に対して透過性を有する波長のレーザ光をウェーハ内部に集光し、分割するための起点(改質層: 以下「SD層」と称する)を形成した後、ウェーハに外部応力を加えて小片化するダイシング技術です。プロセスは、主にウェーハ内部に分割するためのSD層を形成する「レーザ照射工程」と、ウェーハを小片化する「エキスパンド工程」の2つから構成されています。
レーザ光をウェーハ内部に集光させて、分割するためのSD層を形成します。内部に形成されたSD層からウェーハの表裏面に向かってき裂も形成されており、レーザ光をスキャンすることでき裂を切断予定ラインに沿って繋げます。また、MEMSデバイスのような厚いウェーハを切断する場合には、ウェーハの厚み方向に複数のSD層を形成してき裂を繋ぎ合わせます。
SD層は目的に応じて4つの様態を使い分ける必要があり、これらを組み合わせて最適な加工条件を導き出します。ウェーハの厚さやチップの形状 ・ 金属膜の有無など、半導体デバイスの状態に応じて最適な加工条件が存在します。
SD層を形成したウェーハに対して、テープエキスパンドなどでテープを外周方向に均一に引っ張ることで外部応力を加えます。それにより、ウェーハ内部のき裂に引張応力が加わり、き裂が表裏面に伸展して小片化されます。
分割はき裂の伸展によって行われるため、デバイスへのストレスがありません。また、基本的に切削ロスがないため、チップ収率の向上に繋がります。
ステルスダイシング技術によって切り出されたメンブレン構造体を有するMEMSデバイスと、保護膜や金属膜などを有するデバイスの写真を示します。チップの表裏面にチッピングのないシャープなダイシング品質が得られています。また、チップ中央部のメンブレン構造体に破損やゴミなどの付着がない良好なダイシング結果が得られています。
ステルスダイシング技術はその画期的な原理により、ブレードダイシングやアブレーションダイシングが抱える問題を解決します。
ブレードダイシングは、冷却水をかけながら、ダイヤモンド砥石を高速回転させてウェーハを切断するため、以下のような問題を抱えています。
○ 振動や冷却水・洗浄水による応力負荷・再汚染
○ チッピングによる強度低下
○ 飛散物による脆弱な構造体の破損・汚染(保護膜の形成工程・除去工程の追加)
○ チップ収率の限界
○ 加工速度の限界
レーザを利用したダイシング技術として、アブレーション方式のレーザダイシングがあります。
アブレーションダイシングは、レーザ光をウェーハ表面に集光し、溝を掘ってウェーハを切断するため、以下のような問題を抱えています。
○ HAZ(Heat Affected Zone)と呼ばれる熱影響による強度低下
○ 飛散物による脆弱な構造体の破損・汚染(保護膜の形成工程・除去工程の追加)
○ チップ収率の限界
○ 加工速度の限界
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