電子線(Electron Beam、EB)は荷電粒子線の一種であり、放射線のカテゴリーに含まれます。エネルギーや発生方法は用途によって異なり、加速器で高エネルギー化した電子線から、低エネルギーで表面処理に用いる電子線まで幅広く存在します。電子線は、電子の運動エネルギーを利用して物質に作用します。当社のEB-ENGINE 低エネルギー電子線照射源は、EB源内(真空中)に設置されたフィラメントから熱電子を発生させ高電圧で加速する方式で電子線を放出しています。
電子が対象物に照射されると、イオン化・励起反応を引き起こし、分子内の化学結合が切断されてラジカルが生成されます。このラジカルを起点として、進行する化学反応を活用することで、さまざまな電子線応用が期待できます。
高エネルギーの電子が大気圧中に放出され、照射対象物に入射します。
電子のエネルギーにより、分子がイオン化または励起状態になり、結合が不安定化します。
結合が切断され、反応性の高いラジカルが生成されます。これが後続の化学反応の起点となります。
生成したラジカルを介して、分子間で架橋、分解、グラフト重合などの反応が進行し、材料の特性が変化します。
電子線のエネルギーは、電子が持つ運動エネルギーを指し、通常はkeV(キロ電子ボルト)やMeV(メガ電子ボルト)で表されます。このエネルギーは、電子線が物質にどの程度深く到達できるかを決定する重要な要素です。さらに、エネルギー利用効率(付与効率)も重要です。これは、照射した電子線のエネルギーがどれだけ有効に材料に作用するかを示します。低エネルギー電子線は、対象物の表面に対するエネルギー付与効率が非常に高いため、比較的少ない電子数(電流量)でも十分な改質効果を得られます。これにより、消費電力を抑えつつ高品質な表面処理が可能となり、基材深部へのダメージを防ぎながら、効率的で安定した加工を実現できます。
浸透深さが浅く、表面層の改質や硬化に適しています。基材内部への影響を抑えながら、表面処理を行う用途に利用されます。
透過深さが深く、厚みのある材料や深部の改質に適しています。ただし、過剰なエネルギーは基材に損傷を与えるリスクがあります。
電子線を用いた装置では、電子線がターゲットに衝突する際に制動放射(X線)が発生します。このため、製造ラインにはX線による被ばくを防ぐための遮へい設備が必要です。
低エネルギー電子線(数十~数百keV)は、高エネルギーの電子線よりも発生するX線の強度が低く、遮へい設備は比較的簡易で済みます。これにより、装置の設計や設置コストを抑えやすくなります。
逆に電子線エネルギーが高くなると、発生するX線の強度が高くなるため、鉛やコンクリートなどの厚い遮へい構造が必要となり、設備規模やイニシャルコストが大きくなります。
さらに、遮へい設備の規模は、製造ラインの初期投資だけでなく、運転時の電力消費やランニングコストにも影響します。
低エネルギーかつ高効率な電子線源を採用することで、遮へい設備を簡素化し、消費電力や運用コストを大幅に削減することが可能です。
| 項目 | 低エネルギー電子線 | 高エネルギー電子線 |
|---|---|---|
| 加速電圧 | 70 kV | 300 kV |
| 遮へい厚さ | 鉛3 mm | 鉛17 mm |
| 設備規模 | 小 | 大 |
| イニシャルコスト | 小 | 大 |
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