Cleaning

This process removes foreign matters such as particles, and contaminants such as organic substances, oxide films, metal materials, oil, and grease.


Cleaning is necessary before and after each process, such as deposition and etching processes, and this has a great impact on yield and reliability improvement.

The cleaning process involves various steps, including wet cleaning with specific solvents to remove residues and particles from the wafer surface. Additionally, dry cleaning processes such as plasma cleaning and cryogenic cleaning may be employed to remove contaminants without the use of liquid solvents. These advanced techniques contribute to the overall cleanliness of semiconductor components and enhance the reliability of the final devices.

Dry cleaning

A dry cleaning using light, also called photo cleaning, does not use any solvents such as chemicals and water. The high photon energy can efficiently break molecular bonds in organic materials to achieve efficient cleaning ability.  In addition, dry cleaning is more sustainable and environmentally friendly since no additional drying processes are required.

Recommended products

FLAT EXCIMER

This excimer lamp light source enables uniform illumination over a large area by using a flat lamp. In addition to high cleaning capacity, the light source enables damage-free, dust-free, high-quality cleaning.

Common process steps across semiconductor manufacturing

Electrostatic charge removal (ESD)

Explore Hamamatsu's meticulously engineered electrostatic charge removal solutions, designed to enhance reliability across various processes. Our technology efficiently removes charges that could potentially damage the wafer, ensuring high-quality processes.

Wafer alignment

Elevate semiconductor manufacturing with Hamamatsu's solutions for wafer alignment. Our technologies are designed for accurate wafer positioning, enhancing efficiency and yield in semiconductor production. Discover how we are helping wafer alignment, delivering unparalleled reliability and performance for your semiconductor processing needs.

Inspection for particle contamination and surface defects

Ensure pristine semiconductor production with Hamamatsu's advanced wafer inspection for contaminates solutions. Discover our sophisticated technologies meticulously crafted for accurate contaminant detection, safeguarding semiconductor wafers from impurities. Explore how Hamamatsu's expertise in wafer inspection sets the standard for reliability and quality in semiconductor manufacturing processes.

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