砥石を用いて研削することでウェーハを薄化加工する工程です。
ウェーハ厚を測定してプロセス管理を行います。
ウェーハの厚みを測定して各工程にフィードバックすることにより、不良の発生を抑制して歩留まりを向上させます。
非接触かつリアルタイムで薄膜の膜厚測定が可能です。装置組み込みを容易にするために小型化を実現しています。
レーザ干渉法を採用した非接触で膜厚測定が可能な装置です。厚みのあるガラス等が測定可能です。
キセノンガスを充填したバルブ内の放電電極間に、集光したレーザ光でプラズマを発生させて発光を維持する方式を採用した世界で唯一の光源です。従来のキセノンランプに比べて、高輝度点発光・長寿命といった特長があります。
ウェーハなどの搬送時に発生する静電気による帯電の除去を行います。
半導体デバイスは小型化・微細化・高集積化に伴い静電気による影響が大きくなり、静電気対策の重要性が高まっています。Photoionization(光イオン化)を利用することにより、塵や電磁ノイズ・オゾンの発生しないクリーンな除電を実現します。
大気中において高い除電能力を誇る静電気除去装置です。微弱X線を利用することにより、送風不要での0V除電を実現します。また、塵や電磁ノイズの発生がありません。
ウェーハ搬送における位置合わせを行います。
カセットから引き出しやポジションテーブルにセンタリングなどにおいて搬送位置がズレることで不良発生やスループット低下に繋がるため、高速かつ高精度な位置決めと補正が必要です。
縦長画素 (14 × 200 μm)の受光部を採用した高感度CMOSリニアイメージセンサです。紫外域から近赤外域で高感度を実現しています。
電気エネルギーを光エネルギーに変換する半導体素子です。主に受光素子と組み合わせて使用します。赤色から赤外の波長のさまざまなパッケージのLEDを用意しています。
ウェーハの表面異物や内部欠陥の検査を行います。
表面異物検査用可視光デバイスや内部観察用近赤外カメラにより、非破壊・非接触での微小異物や微細欠陥の検査を可能にします。
近赤外域に高い感度をもつAPS型CMOSエリアイメージセンサです。画素フォーマットは、SXGA (1280 × 1024画素)で、最大146 frames/sでの撮像が可能です。
高速撮像時などの低照度下においても十分な明るさの画像が得られるTDI-CCDです。TDI動作により、移動する対象物を積分露光することで、感度を飛躍的に向上させました。
近赤外域に感度を有するカメラです。内部を透過撮影することで欠陥やボイド検査を可能にします。
紫外域において高い出力を有する安定性に優れた光源です。紫外域において連続スペクトルを有しており、また分析機器用ランプとして要求される長寿命・高安定・高出力を併せ持っています。
高い輝度・色温度で紫外域から赤外域までの連続スペクトルを有する光源です。弊社独自の高性能陰極の採用により、精密測光用ランプとして幅広く使用されています。
瞬間的な高いピーク出力を有するパルス点灯光源です。紫外域から赤外域までの連続スペクトルにより、分析からイメージングまで幅広い用途で使用されています。
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